Jan-Yu Weng CEO announcement
Dear Pivotal Systems Partners, It is with great pleasure and excitement that we announce the appointment of our new Chief
April 29, 2024
Precision Engineered for Excellence
Discover Pivotal Systems’ state-of-the-art flow monitoring and process control technology, meticulously designed for the global semiconductor manufacturing industry and high-tech industries.
Welcome to Pivotal Systems
As process geometries within the semiconductor industry continue to shrink to 3nm and beyond, the need for highly accurate, responsive and repeatable gas flow control during wafer processing is essential. With the emergence of low gas flow rates, short processing times and continuous plasma processing, best-in-class MFCs are struggling to meet the accuracy, settling time and repeatability requirements demanded to ensure high yield and matched chambers.
The platform includes not only Pivotal’s Gas Flow Controller (GFC) product lines that offer high-accuracy, real-time monitoring and control of the most critical parameters difficult to control in wafer processing today: Gas Flow and Chamber Condition, but also advanced Flow Ratio Controller (FRC), Positional Mass Flow Controller(PFC), Pressure Controller, Ultra High-Speed Valve and etc.
Revolutionizing Semiconductor Manufacturing
At Pivotal Systems, we aim to significantly enhance fab productivity and capital efficiency with our advanced flow process monitoring and control solutions.
Our Products
Pivotal Systems paves the way for the future of flow monitoring and control.
STANDARD GAS FLOW CONTROLLER (GFC)
GFC20™ GFC200™ GFC1000™ GFC2000™
The GFC combines Pivotal’s patented, high accuracy GFM™ system with patented control valve technology. As such, it leapfrogs the current MFC technology by offering an order of magnitude improvement on key flow metrics, thereby enabling advanced wafer-manufacturing processes.
HIGH FLOW GAS FLOW CONTROLLER (GFC HFlo)
GFC5L™ GFC20L™ GFC50L™
The high flow GFC combines a differential pressure with patented control valve technology. As such, it leapfrogs the current MFC technology by offering an order of magnitude improvement on key flow metrics, thereby enabling advanced wafer-manufacturing processes.
FLOW RATIO CONTROLLER (FRC)
Pivotal is now introducing a flow ratio controller that uses Pivotal’s proprietary control valve to improve wafer uniformity and wafer to wafer uniformity. It’s the industry’s fastest Flow Ratio Controller, meeting a <1 sec. settling time requirement.
Applications
Being used by the leading IDMs, foundries and OEMs present day in wafer processing, Pivotal’s full product line of Gas Flow Controllers (GFC) offers not only the highest accuracy but also real-time monitoring and control of the most critical gas flow parameters, to obviously enhance yield and productivity by avoiding catastrophic scrap events, tightening process windows, matching chambers and eliminating the need for the calibration of offline flow.
- Critical Etch
- CVD / Deposition
- Critical Low Flow
- Atomic Layer Etch
- Atomic Layer Dep
About Pivotal
Pivotal Systems Corporation provides best-in-class monitoring and process control technology for the semiconductor manufacturing industry. Pivotal’s vision is to enable an order of magnitude increase in fab productivity and capital efficiency for current and future technology nodes. This vision is achieved through its real time in situ process monitoring and control solutions. Founded in 2004 and based in Fremont, California, the company is led by veterans from the semiconductor and high-tech industries.
Latest News
Pivotal Systems Will Showcase at Semicon West 2024 with New Products Launch
At the same time, FRC (Flow Ratio Controller) and PFC (Position-based Mass Flow Controller) products launch will be held on
April 26, 2024
Pivotal Systems Showcasing Industry’s Fastest Gas Flow Controller at Semicon Korea 2024
At SEMICON KOREA 2024 from January 31 to February 2, Pivotal Systems Corporation (“Pivotal” or the “Company”) is exhibiting the
January 31, 2024